Whole rock geochemistry of Forearc Basalts from IODP Expedition 352

These basalts represent the earliest response to subduction initiation in the Izu-Bonin arc system during the early Eocene. They are highly refractory and formed by high degrees of partial melting of a previously depleted source.

Data and Resources

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Cite this as

Shervais, John W, Reagan, Mark, Haugen, Emily, Almeev, Renat, Pearce, Julian, Prytulak, Julie, Ryan, Jeffrey G, Whattam, Scott Andrew, Godard, Marguerite, Chapman, Timothy, Li, Hongyan, Kurz, Walter, Nelson, Wendy R, Heaton, Daniel, Kirchenbaur, Maria, Shimizu, Kenji, Sakuyama, Tetsuya, Li, Yibing, Vetter, Scott K (2018). Dataset: Whole rock geochemistry of Forearc Basalts from IODP Expedition 352. https://doi.org/10.1594/PANGAEA.895122

DOI retrieved: 2018

Additional Info

Field Value
Imported on November 29, 2024
Last update November 29, 2024
License CC-BY-4.0
Source https://doi.org/10.1594/PANGAEA.895122
Author Shervais, John W
Given Name John W
Family Name Shervais
More Authors
Reagan, Mark
Haugen, Emily
Almeev, Renat
Pearce, Julian
Prytulak, Julie
Ryan, Jeffrey G
Whattam, Scott Andrew
Godard, Marguerite
Chapman, Timothy
Li, Hongyan
Kurz, Walter
Nelson, Wendy R
Heaton, Daniel
Kirchenbaur, Maria
Shimizu, Kenji
Sakuyama, Tetsuya
Li, Yibing
Vetter, Scott K
Source Creation 2018
Publication Year 2018
Resource Type text/tab-separated-values - filename: Shervais-etal_2018
Subject Areas
Name: Chemistry

Name: Geophysics

Name: Lithosphere

Related Identifiers
Title: Magmatic Response to Subduction Initiation, Part I: Forearc basalts of the Izu-Bonin Arc from IODP Expedition 352
Identifier: https://doi.org/10.1029/2018GC007731
Type: DOI
Relation: IsSupplementTo
Year: 2018
Source: Geochemistry, Geophysics, Geosystems
Authors: Shervais John W , Reagan Mark , Haugen Emily , Almeev Renat , Pearce Julian , Prytulak Julie , Ryan Jeffrey G , Whattam Scott Andrew , Godard Marguerite , Chapman Timothy , Li Hongyan , Kurz Walter , Nelson Wendy R , Heaton Daniel , Kirchenbaur Maria , Shimizu Kenji , Sakuyama Tetsuya , Li Yibing , Vetter Scott K .